Number of the records: 1
Advances in CMP/polishing technologies for the manufacture of electronic devices
- KB 30242
Advances
Advances in CMP/polishing technologies for the manufacture of electronic devices / edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. -- 1st ed. -- Oxford : William Andrew, 2012. -- xii, 317 s. : il., grafy. -- ISBN : 978-1-4377-7859-5 (váz.).
Doi, Toshiro K., 1947-. Marinescu, Ioan D.. Kurokawa, Syuhei
broušení. fyzika povrchů pevných látek. elektronika. čisticí technika. monografie
621.923. 539.211. 621.38. 648.5.06. (048.8)
Number of the records: 1